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Factors associated with mask wearing among psychiatric inpatients during the COVID-19 pandemic
Autores principales: | Jung, Ha-Ran, Park, Cheol, Kim, Mina, Jhon, Min, Kim, Ju-Wan, Ryu, Seunghyong, Lee, Ju-Yeon, Kim, Jae-Min, Park, Kyung-Hwa, Jung, Sook-In, Yoon, Bo-Hyun, Kim, Sung-Wan |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Elsevier B.V.
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7831677/ https://www.ncbi.nlm.nih.gov/pubmed/33476952 http://dx.doi.org/10.1016/j.schres.2020.12.029 |
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