Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO(2) Thin Films via Atomic Layer Deposition

In this study, the effect of radical intensity on the deposition mechanism, optical, and electrical properties of tin oxide (SnO(2)) thin films is investigated. The SnO(2) thin films are prepared by plasma-enhanced atomic layer deposition with different plasma power from 1000 to 3000 W. The experime...

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Detalles Bibliográficos
Autores principales: Huang, Pao-Hsun, Zhang, Zhi-Xuan, Hsu, Chia-Hsun, Wu, Wan-Yu, Huang, Chien-Jung, Lien, Shui-Yang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7867222/
https://www.ncbi.nlm.nih.gov/pubmed/33540775
http://dx.doi.org/10.3390/ma14030690

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7867222/
https://www.ncbi.nlm.nih.gov/pubmed/33540775
http://dx.doi.org/10.3390/ma14030690

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