Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...

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Detalles Bibliográficos
Autores principales: Seewald, Lukas Matthias, Winkler, Robert, Kothleitner, Gerald, Plank, Harald
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7911092/
https://www.ncbi.nlm.nih.gov/pubmed/33499214
http://dx.doi.org/10.3390/mi12020115

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7911092/
https://www.ncbi.nlm.nih.gov/pubmed/33499214
http://dx.doi.org/10.3390/mi12020115

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