Influence of Conditioning Temperature on Defects in the Double Al(2)O(3)/ZnO Layer Deposited by the ALD Method

In this work, we present the results of defects analysis concerning ZnO and Al(2)O(3) layers deposited by atomic layer deposition (ALD) technique. The analysis was performed by the X-band electron paramagnetic resonance (EPR) spectroscopy, transmission electron microscopy (TEM) and X-ray photoelectr...

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Detalles Bibliográficos
Autores principales: Gawlińska-Nęcek, Katarzyna, Wlazło, Mateusz, Socha, Robert, Stefaniuk, Ireneusz, Major, Łukasz, Panek, Piotr
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7926577/
https://www.ncbi.nlm.nih.gov/pubmed/33671703
http://dx.doi.org/10.3390/ma14041038

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7926577/
https://www.ncbi.nlm.nih.gov/pubmed/33671703
http://dx.doi.org/10.3390/ma14041038

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