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An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness

A novel integrated sensor for the simultaneous measurement of layer refractive index and thickness based on evanescent fields is proposed. The theoretical limits for the accuracy of the sensor were examined for the example of a [Formula: see text] layer. The influence of production tolerance on the...

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Autores principales: Jäger, Matthias, Bruns, Jürgen, Schneidewind, Jessica, Pinnow, Cay, Gargouri, Hassan, Petermann, Klaus
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7956392/
https://www.ncbi.nlm.nih.gov/pubmed/33652576
http://dx.doi.org/10.3390/s21051628
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author Jäger, Matthias
Bruns, Jürgen
Schneidewind, Jessica
Pinnow, Cay
Gargouri, Hassan
Petermann, Klaus
author_facet Jäger, Matthias
Bruns, Jürgen
Schneidewind, Jessica
Pinnow, Cay
Gargouri, Hassan
Petermann, Klaus
author_sort Jäger, Matthias
collection PubMed
description A novel integrated sensor for the simultaneous measurement of layer refractive index and thickness based on evanescent fields is proposed. The theoretical limits for the accuracy of the sensor were examined for the example of a [Formula: see text] layer. The influence of production tolerance on the accuracy was evaluated. In the experimental part of this work, a sensor chip containing nanowire and nanorib waveguides realized in silicon on insulator technology was used to demonstrate the detection of refractive index and thickness of a [Formula: see text] atomic layer deposition (ALD) layer.
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spelling pubmed-79563922021-03-16 An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness Jäger, Matthias Bruns, Jürgen Schneidewind, Jessica Pinnow, Cay Gargouri, Hassan Petermann, Klaus Sensors (Basel) Communication A novel integrated sensor for the simultaneous measurement of layer refractive index and thickness based on evanescent fields is proposed. The theoretical limits for the accuracy of the sensor were examined for the example of a [Formula: see text] layer. The influence of production tolerance on the accuracy was evaluated. In the experimental part of this work, a sensor chip containing nanowire and nanorib waveguides realized in silicon on insulator technology was used to demonstrate the detection of refractive index and thickness of a [Formula: see text] atomic layer deposition (ALD) layer. MDPI 2021-02-26 /pmc/articles/PMC7956392/ /pubmed/33652576 http://dx.doi.org/10.3390/s21051628 Text en © 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Communication
Jäger, Matthias
Bruns, Jürgen
Schneidewind, Jessica
Pinnow, Cay
Gargouri, Hassan
Petermann, Klaus
An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title_full An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title_fullStr An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title_full_unstemmed An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title_short An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness
title_sort integrated evanescent field sensor for the simultaneous measurement of layer refractive index and thickness
topic Communication
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7956392/
https://www.ncbi.nlm.nih.gov/pubmed/33652576
http://dx.doi.org/10.3390/s21051628
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