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Guiding Chart for Initial Layer Choice with Nanoimprint Lithography
When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, ‘partial cavity filling’ is an efficient strategy to provide a negligible residual layer. However, this strategy requires an ad...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7998794/ https://www.ncbi.nlm.nih.gov/pubmed/33799870 http://dx.doi.org/10.3390/nano11030710 |