UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns

Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...

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Detalles Bibliográficos
Autores principales: Thanner, Christine, Eibelhuber, Martin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8004728/
https://www.ncbi.nlm.nih.gov/pubmed/33806976
http://dx.doi.org/10.3390/nano11030822

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8004728/
https://www.ncbi.nlm.nih.gov/pubmed/33806976
http://dx.doi.org/10.3390/nano11030822

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