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UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns

Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...

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Autores principales: Thanner, Christine, Eibelhuber, Martin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8004728/
https://www.ncbi.nlm.nih.gov/pubmed/33806976
http://dx.doi.org/10.3390/nano11030822
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author Thanner, Christine
Eibelhuber, Martin
author_facet Thanner, Christine
Eibelhuber, Martin
author_sort Thanner, Christine
collection PubMed
description Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and down to the nanometer range. Best results can be achieved if the fundamental behavior of the imprint resist and the pattern filling are considered by the equipment and process parameters. In particular, the material properties and pattern size and shape play a crucial role. For capillary force-driven filling behavior it is important to understand the influencing parameters and respective failure modes in order to optimize the processes for reliable full wafer manufacturing. In this work, the nanoimprint results obtained for different pattern geometries are compared with respect to pattern quality and residual layer thickness: The comprehensive overview of the relevant process parameters is helpful for setting up NIL processes for different nanostructures with minimum layer thickness.
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spelling pubmed-80047282021-03-29 UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns Thanner, Christine Eibelhuber, Martin Nanomaterials (Basel) Article Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and down to the nanometer range. Best results can be achieved if the fundamental behavior of the imprint resist and the pattern filling are considered by the equipment and process parameters. In particular, the material properties and pattern size and shape play a crucial role. For capillary force-driven filling behavior it is important to understand the influencing parameters and respective failure modes in order to optimize the processes for reliable full wafer manufacturing. In this work, the nanoimprint results obtained for different pattern geometries are compared with respect to pattern quality and residual layer thickness: The comprehensive overview of the relevant process parameters is helpful for setting up NIL processes for different nanostructures with minimum layer thickness. MDPI 2021-03-23 /pmc/articles/PMC8004728/ /pubmed/33806976 http://dx.doi.org/10.3390/nano11030822 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) ).
spellingShingle Article
Thanner, Christine
Eibelhuber, Martin
UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title_full UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title_fullStr UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title_full_unstemmed UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title_short UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
title_sort uv nanoimprint lithography: geometrical impact on filling properties of nanoscale patterns
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8004728/
https://www.ncbi.nlm.nih.gov/pubmed/33806976
http://dx.doi.org/10.3390/nano11030822
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