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UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8004728/ https://www.ncbi.nlm.nih.gov/pubmed/33806976 http://dx.doi.org/10.3390/nano11030822 |