Stress-Assisted Thermal Diffusion Barrier Breakdown in Ion Beam Deposited Cu/W Nano-Multilayers on Si Substrate Observed by in Situ GISAXS and Transmission EDX

[Image: see text] The thermal stability of Cu/W nano-multilayers deposited on a Si substrate using ion beam deposition was analyzed in situ by GISAXS and transmission EDX—a combination of methods permitting the observation of diffusion processes within buried layers. Further supporting techniques su...

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Detalles Bibliográficos
Autores principales: Romano Brandt, León, Salvati, Enrico, Wermeille, Didier, Papadaki, Chrysanthi, Le Bourhis, Eric, Korsunsky, Alexander M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8023532/
https://www.ncbi.nlm.nih.gov/pubmed/33507755
http://dx.doi.org/10.1021/acsami.0c19173

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8023532/
https://www.ncbi.nlm.nih.gov/pubmed/33507755
http://dx.doi.org/10.1021/acsami.0c19173

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