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Observation of void formation patterns in SnAg films undergoing electromigration and simulation using random walk methods

With the ever-reducing sizes of electronic devices, the problem of electromigration (EM) has become relevant and requires attention. However, only the EM behavior of Sn–Ag solders within the solder joint structure has been focused on thus far. Therefore, in this study, a thin metallic film composed...

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Detalles Bibliográficos
Autores principales: Jin, Zhi, Shen, Yu-An, Zuo, Yang, Chan, Y. C., Mannan, S. H., Nishikawa, Hiroshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8060422/
https://www.ncbi.nlm.nih.gov/pubmed/33883649
http://dx.doi.org/10.1038/s41598-021-88122-w