Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs)

In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit...

Descripción completa

Detalles Bibliográficos
Autores principales: Cara, Eleonora, Murataj, Irdi, Milano, Gianluca, De Leo, Natascia, Boarino, Luca, Ferrarese Lupi, Federico
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8069880/
https://www.ncbi.nlm.nih.gov/pubmed/33924480
http://dx.doi.org/10.3390/nano11040994

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8069880/
https://www.ncbi.nlm.nih.gov/pubmed/33924480
http://dx.doi.org/10.3390/nano11040994

Ejemplares similares