Cargando…
Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs)
In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8069880/ https://www.ncbi.nlm.nih.gov/pubmed/33924480 http://dx.doi.org/10.3390/nano11040994 |