One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a combination of H(2) and HCl gases in a reactive io...

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Detalles Bibliográficos
Autores principales: Yoon, Ho-Won, Shin, Seung-Min, Kwon, Seong-Yong, Cho, Hyun-Min, Kim, Sang-Gab, Hong, Mun-Pyo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8073132/
https://www.ncbi.nlm.nih.gov/pubmed/33920632
http://dx.doi.org/10.3390/ma14082025

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8073132/
https://www.ncbi.nlm.nih.gov/pubmed/33920632
http://dx.doi.org/10.3390/ma14082025

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