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Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films
The influence of film thickness on the structural and optical properties of silicon dioxide (SiO(2)) and zinc oxide (ZnO) thin films deposited by radio frequency magnetron sputtering on quartz substrates was investigated. The deposition conditions were optimized to achieve stoichiometric thin films....
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8077636/ https://www.ncbi.nlm.nih.gov/pubmed/33968560 http://dx.doi.org/10.3762/bjnano.12.29 |