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Fabrication of 2-Inch Free-Standing GaN Substrate on Sapphire With a Combined Buffer Layer by HVPE

Free-standing GaN substrates are urgently needed to fabricate high-power GaN-based devices. In this study, 2-inch free-standing GaN substrates with a thickness of ~250 μm were successfully fabricated on double-polished sapphire substrates, by taking advantage of a combined buffer layer using hydride...

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Detalles Bibliográficos
Autores principales: Liu, Nanliu, Jiang, Yongjing, Xiao, Jian, Liang, Zhiwen, Wang, Qi, Zhang, Guoyi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Frontiers Media S.A. 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8115016/
https://www.ncbi.nlm.nih.gov/pubmed/33996764
http://dx.doi.org/10.3389/fchem.2021.671720