Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

We present a method to produce small pitch gratings for X-ray interferometric imaging applications, allowing the phase sensitivity to be increased and/or the length of the laboratory setup to be minimized. The method is based on fabrication of high aspect ratio silicon microstructures using deep rea...

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Detalles Bibliográficos
Autores principales: Jefimovs, Konstantins, Vila-Comamala, Joan, Arboleda, Carolina, Wang, Zhentian, Romano, Lucia, Shi, Zhitian, Kagias, Matias, Stampanoni, Marco
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8147938/
https://www.ncbi.nlm.nih.gov/pubmed/34066906
http://dx.doi.org/10.3390/mi12050517

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8147938/
https://www.ncbi.nlm.nih.gov/pubmed/34066906
http://dx.doi.org/10.3390/mi12050517

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