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An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology
Presently, growing attention is being given to the analysis of the impact of the ambient temperature on the GaN HEMT performance. The present article is aimed at investigating both DC and microwave characteristics of a GaN-based HEMT versus the ambient temperature using measured data, an equivalent-...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8150306/ https://www.ncbi.nlm.nih.gov/pubmed/34065962 http://dx.doi.org/10.3390/mi12050549 |
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author | Alim, Mohammad Abdul Gaquiere, Christophe Crupi, Giovanni |
author_facet | Alim, Mohammad Abdul Gaquiere, Christophe Crupi, Giovanni |
author_sort | Alim, Mohammad Abdul |
collection | PubMed |
description | Presently, growing attention is being given to the analysis of the impact of the ambient temperature on the GaN HEMT performance. The present article is aimed at investigating both DC and microwave characteristics of a GaN-based HEMT versus the ambient temperature using measured data, an equivalent-circuit model, and a sensitivity-based analysis. The tested device is a 0.15-μm ultra-short gate-length AlGaN/GaN HEMT with a gate width of 200 μm. The interdigitated layout of this device is based on four fingers, each with a length of 50 μm. The scattering parameters are measured from 45 MHz to 50 GHz with the ambient temperature varied from −40 °C to 150 °C. A systematic study of the temperature-dependent performance is carried out by means of a sensitivity-based analysis. The achieved findings show that by the heating the transistor, the DC and microwave performance are degraded, due to the degradation in the electron transport properties. |
format | Online Article Text |
id | pubmed-8150306 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-81503062021-05-27 An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology Alim, Mohammad Abdul Gaquiere, Christophe Crupi, Giovanni Micromachines (Basel) Article Presently, growing attention is being given to the analysis of the impact of the ambient temperature on the GaN HEMT performance. The present article is aimed at investigating both DC and microwave characteristics of a GaN-based HEMT versus the ambient temperature using measured data, an equivalent-circuit model, and a sensitivity-based analysis. The tested device is a 0.15-μm ultra-short gate-length AlGaN/GaN HEMT with a gate width of 200 μm. The interdigitated layout of this device is based on four fingers, each with a length of 50 μm. The scattering parameters are measured from 45 MHz to 50 GHz with the ambient temperature varied from −40 °C to 150 °C. A systematic study of the temperature-dependent performance is carried out by means of a sensitivity-based analysis. The achieved findings show that by the heating the transistor, the DC and microwave performance are degraded, due to the degradation in the electron transport properties. MDPI 2021-05-12 /pmc/articles/PMC8150306/ /pubmed/34065962 http://dx.doi.org/10.3390/mi12050549 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Alim, Mohammad Abdul Gaquiere, Christophe Crupi, Giovanni An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title | An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title_full | An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title_fullStr | An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title_full_unstemmed | An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title_short | An Experimental and Systematic Insight into the Temperature Sensitivity for a 0.15-µm Gate-Length HEMT Based on the GaN Technology |
title_sort | experimental and systematic insight into the temperature sensitivity for a 0.15-µm gate-length hemt based on the gan technology |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8150306/ https://www.ncbi.nlm.nih.gov/pubmed/34065962 http://dx.doi.org/10.3390/mi12050549 |
work_keys_str_mv | AT alimmohammadabdul anexperimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology AT gaquierechristophe anexperimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology AT crupigiovanni anexperimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology AT alimmohammadabdul experimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology AT gaquierechristophe experimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology AT crupigiovanni experimentalandsystematicinsightintothetemperaturesensitivityfora015μmgatelengthhemtbasedonthegantechnology |