Two-Step Growth of Uniform Monolayer MoS(2) Nanosheets by Metal–Organic Chemical Vapor Deposition

[Image: see text] To achieve large area growth of transition metal dichalcogenides of uniform monolayer thickness, we demonstrate metal–organic chemical vapor deposition (MOCVD) growth under low pressure followed by a high-temperature sulfurization process under atmospheric pressure (AP). Following...

Descripción completa

Detalles Bibliográficos
Autores principales: Chowdhury, Sayema, Roy, Anupam, Liu, Chison, Alam, Md Hasibul, Ghosh, Rudresh, Chou, Harry, Akinwande, Deji, Banerjee, Sanjay K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8153749/
https://www.ncbi.nlm.nih.gov/pubmed/34056187
http://dx.doi.org/10.1021/acsomega.1c00727

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8153749/
https://www.ncbi.nlm.nih.gov/pubmed/34056187
http://dx.doi.org/10.1021/acsomega.1c00727

Ejemplares similares