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Two-Step Growth of Uniform Monolayer MoS(2) Nanosheets by Metal–Organic Chemical Vapor Deposition

[Image: see text] To achieve large area growth of transition metal dichalcogenides of uniform monolayer thickness, we demonstrate metal–organic chemical vapor deposition (MOCVD) growth under low pressure followed by a high-temperature sulfurization process under atmospheric pressure (AP). Following...

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Detalles Bibliográficos
Autores principales:	Chowdhury, Sayema, Roy, Anupam, Liu, Chison, Alam, Md Hasibul, Ghosh, Rudresh, Chou, Harry, Akinwande, Deji, Banerjee, Sanjay K.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	American Chemical Society 2021
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8153749/ https://www.ncbi.nlm.nih.gov/pubmed/34056187 http://dx.doi.org/10.1021/acsomega.1c00727

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