Stability Evaluation of Candidate Precursors for Chemical Vapor Deposition of Hafnium Diboride (HfB(2))

[Image: see text] Alternative candidate precursors to [Hf(BH(4))(4)] for low-temperature chemical vapor deposition of hafnium diboride (HfB(2)) films were identified using density functional theory simulations of molecules with the composition [Hf(BH(4))(2)L(2)], where L = −OH, −OMe, −O-t-Bu, −NH(2)...

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Detalles Bibliográficos
Autores principales: Rimsza, Jessica M., Chackerian, Samuel C. B., Boyle, Timothy J., Hernandez-Sanchez, Bernadette A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8153926/
https://www.ncbi.nlm.nih.gov/pubmed/34056295
http://dx.doi.org/10.1021/acsomega.1c00391

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8153926/
https://www.ncbi.nlm.nih.gov/pubmed/34056295
http://dx.doi.org/10.1021/acsomega.1c00391

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