In Situ Photoacoustic Study of Optical Properties of P-Type (111) Porous Silicon Thin Films

Porous silicon (PSi) on p [Formula: see text]-type (111) silicon substrate has been fabricated by electronically etching method in hydrofluoric acid (HF) media from 5 to 110 mA/cm [Formula: see text] of anodizing current density. The problem of determining the optical properties of (111) PSi is boar...

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Detalles Bibliográficos
Autores principales: Ramirez-Gutierrez, Cristian Felipe, Lujan-Cabrera, Ivan Alonso, Isaza, Cesar, Anaya Rivera, Ely Karina, Rodriguez-Garcia, Mario Enrique
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8156881/
https://www.ncbi.nlm.nih.gov/pubmed/34067597
http://dx.doi.org/10.3390/nano11051314

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8156881/
https://www.ncbi.nlm.nih.gov/pubmed/34067597
http://dx.doi.org/10.3390/nano11051314

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