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In Situ Photoacoustic Study of Optical Properties of P-Type (111) Porous Silicon Thin Films

Porous silicon (PSi) on p [Formula: see text]-type (111) silicon substrate has been fabricated by electronically etching method in hydrofluoric acid (HF) media from 5 to 110 mA/cm [Formula: see text] of anodizing current density. The problem of determining the optical properties of (111) PSi is boar...

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Detalles Bibliográficos
Autores principales:	Ramirez-Gutierrez, Cristian Felipe, Lujan-Cabrera, Ivan Alonso, Isaza, Cesar, Anaya Rivera, Ely Karina, Rodriguez-Garcia, Mario Enrique
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2021
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8156881/ https://www.ncbi.nlm.nih.gov/pubmed/34067597 http://dx.doi.org/10.3390/nano11051314

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