Utilization of Nanoporous Nickel Oxide as the Hole Injection Layer for Quantum Dot Light-Emitting Diodes

[Image: see text] Nickel oxide (NiO(x)) has been extensively investigated as the hole injection layer (HIL) for many optoelectronic devices because of its excellent hole mobility, high environmental stability, and low-cost fabrication. In this research, a NiO(x) thin film and nanoporous layers (NPLs...

Descripción completa

Detalles Bibliográficos
Autores principales: Chen, Wei-Sheng, Yang, Sheng-Hsiung, Tseng, Wei-Cheng, Chen, Wilson Wei-Sheng, Lu, Yuan-Chang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8158834/
https://www.ncbi.nlm.nih.gov/pubmed/34056492
http://dx.doi.org/10.1021/acsomega.1c01618

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8158834/
https://www.ncbi.nlm.nih.gov/pubmed/34056492
http://dx.doi.org/10.1021/acsomega.1c01618

Ejemplares similares