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Utilization of Nanoporous Nickel Oxide as the Hole Injection Layer for Quantum Dot Light-Emitting Diodes
[Image: see text] Nickel oxide (NiO(x)) has been extensively investigated as the hole injection layer (HIL) for many optoelectronic devices because of its excellent hole mobility, high environmental stability, and low-cost fabrication. In this research, a NiO(x) thin film and nanoporous layers (NPLs...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8158834/ https://www.ncbi.nlm.nih.gov/pubmed/34056492 http://dx.doi.org/10.1021/acsomega.1c01618 |