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Silicon Oxide Etching Process of NF(3) and F(3)NO Plasmas with a Residual Gas Analyzer
The use of NF(3) is significantly increasing every year. However, NF(3) is a greenhouse gas with a very high global warming potential. Therefore, the development of a material to replace NF(3) is required. F(3)NO is considered a potential replacement to NF(3). In this study, the characteristics and...
Autores principales: | , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8199652/ https://www.ncbi.nlm.nih.gov/pubmed/34199585 http://dx.doi.org/10.3390/ma14113026 |