Anisotropic silicon nanowire arrays fabricated by colloidal lithography

The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays are coupled and cannot be addressed individually using colloi...

Descripción completa

Detalles Bibliográficos
Autores principales: Rey, Marcel, Wendisch, Fedja Jan, Aaron Goerlitzer, Eric Sidney, Julia Tang, Jo Sing, Bader, Romina Sigrid, Bourret, Gilles Remi, Vogel, Nicolas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8204746/
https://www.ncbi.nlm.nih.gov/pubmed/34212129
http://dx.doi.org/10.1039/d1na00259g

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8204746/
https://www.ncbi.nlm.nih.gov/pubmed/34212129
http://dx.doi.org/10.1039/d1na00259g

Ejemplares similares