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Anisotropic silicon nanowire arrays fabricated by colloidal lithography

The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays are coupled and cannot be addressed individually using colloi...

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Detalles Bibliográficos
Autores principales:	Rey, Marcel, Wendisch, Fedja Jan, Aaron Goerlitzer, Eric Sidney, Julia Tang, Jo Sing, Bader, Romina Sigrid, Bourret, Gilles Remi, Vogel, Nicolas
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2021
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8204746/ https://www.ncbi.nlm.nih.gov/pubmed/34212129 http://dx.doi.org/10.1039/d1na00259g

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