A comprehensive nano-interpenetrating semiconducting photoresist toward all-photolithography organic electronics

Owing to high resolution, reliability, and industrial compatibility, all-photolithography is a promising strategy for industrial manufacture of organic electronics. However, it receives limited success due to the absence of a semiconducting photoresist with high patterning resolution, mobility, and...

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Detalles Bibliográficos
Autores principales: Chen, Renzhong, Wang, Xuejun, Li, Xin, Wang, Hongxiang, He, Mingqian, Yang, Longfei, Guo, Qianying, Zhang, Shen, Zhao, Yan, Li, Yang, Liu, Yunqi, Wei, Dacheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2021
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8213218/
https://www.ncbi.nlm.nih.gov/pubmed/34144989
http://dx.doi.org/10.1126/sciadv.abg0659

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8213218/
https://www.ncbi.nlm.nih.gov/pubmed/34144989
http://dx.doi.org/10.1126/sciadv.abg0659

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