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A comprehensive nano-interpenetrating semiconducting photoresist toward all-photolithography organic electronics
Owing to high resolution, reliability, and industrial compatibility, all-photolithography is a promising strategy for industrial manufacture of organic electronics. However, it receives limited success due to the absence of a semiconducting photoresist with high patterning resolution, mobility, and...
| Autores principales: | , , , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Association for the Advancement of Science
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8213218/ https://www.ncbi.nlm.nih.gov/pubmed/34144989 http://dx.doi.org/10.1126/sciadv.abg0659 |