Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO(2) Coating

The chemical, structural, morphological, and optical properties of Al-doped TiO(2) thin films, called TiO(2)/Al(2)O(3) nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si <100> and commercial SLG glass were discussed. High-quality PEALD TiO(2)/Al(2)O(3) nanolam...

Descripción completa

Detalles Bibliográficos
Autores principales: Chiappim, William, Testoni, Giorgio, Miranda, Felipe, Fraga, Mariana, Furlan, Humber, Saravia, David Ardiles, Sobrinho, Argemiro da Silva, Petraconi, Gilberto, Maciel, Homero, Pessoa, Rodrigo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8223979/
https://www.ncbi.nlm.nih.gov/pubmed/34063804
http://dx.doi.org/10.3390/mi12060588

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8223979/
https://www.ncbi.nlm.nih.gov/pubmed/34063804
http://dx.doi.org/10.3390/mi12060588

Ejemplares similares