Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering

We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investiga...

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Detalles Bibliográficos
Autores principales: Mukhopadhyay, Arun Kumar, Roy, Avishek, Bhattacharjee, Gourab, Das, Sadhan Chandra, Majumdar, Abhijit, Wulff, Harm, Hippler, Rainer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/
https://www.ncbi.nlm.nih.gov/pubmed/34207839
http://dx.doi.org/10.3390/ma14123191

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/
https://www.ncbi.nlm.nih.gov/pubmed/34207839
http://dx.doi.org/10.3390/ma14123191

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