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Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering

We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investiga...

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Autores principales: Mukhopadhyay, Arun Kumar, Roy, Avishek, Bhattacharjee, Gourab, Das, Sadhan Chandra, Majumdar, Abhijit, Wulff, Harm, Hippler, Rainer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/
https://www.ncbi.nlm.nih.gov/pubmed/34207839
http://dx.doi.org/10.3390/ma14123191
_version_ 1783712638164795392
author Mukhopadhyay, Arun Kumar
Roy, Avishek
Bhattacharjee, Gourab
Das, Sadhan Chandra
Majumdar, Abhijit
Wulff, Harm
Hippler, Rainer
author_facet Mukhopadhyay, Arun Kumar
Roy, Avishek
Bhattacharjee, Gourab
Das, Sadhan Chandra
Majumdar, Abhijit
Wulff, Harm
Hippler, Rainer
author_sort Mukhopadhyay, Arun Kumar
collection PubMed
description We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu [Formula: see text] N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti [Formula: see text] CuN phase.
format Online
Article
Text
id pubmed-8227993
institution National Center for Biotechnology Information
language English
publishDate 2021
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-82279932021-06-26 Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering Mukhopadhyay, Arun Kumar Roy, Avishek Bhattacharjee, Gourab Das, Sadhan Chandra Majumdar, Abhijit Wulff, Harm Hippler, Rainer Materials (Basel) Article We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu [Formula: see text] N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti [Formula: see text] CuN phase. MDPI 2021-06-09 /pmc/articles/PMC8227993/ /pubmed/34207839 http://dx.doi.org/10.3390/ma14123191 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Mukhopadhyay, Arun Kumar
Roy, Avishek
Bhattacharjee, Gourab
Das, Sadhan Chandra
Majumdar, Abhijit
Wulff, Harm
Hippler, Rainer
Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title_full Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title_fullStr Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title_full_unstemmed Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title_short Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
title_sort surface stoichiometry and depth profile of ti(x)-cu(y)n(z) thin films deposited by magnetron sputtering
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/
https://www.ncbi.nlm.nih.gov/pubmed/34207839
http://dx.doi.org/10.3390/ma14123191
work_keys_str_mv AT mukhopadhyayarunkumar surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT royavishek surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT bhattacharjeegourab surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT dassadhanchandra surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT majumdarabhijit surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT wulffharm surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering
AT hipplerrainer surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering