Cargando…
Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering
We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investiga...
Autores principales: | , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/ https://www.ncbi.nlm.nih.gov/pubmed/34207839 http://dx.doi.org/10.3390/ma14123191 |
_version_ | 1783712638164795392 |
---|---|
author | Mukhopadhyay, Arun Kumar Roy, Avishek Bhattacharjee, Gourab Das, Sadhan Chandra Majumdar, Abhijit Wulff, Harm Hippler, Rainer |
author_facet | Mukhopadhyay, Arun Kumar Roy, Avishek Bhattacharjee, Gourab Das, Sadhan Chandra Majumdar, Abhijit Wulff, Harm Hippler, Rainer |
author_sort | Mukhopadhyay, Arun Kumar |
collection | PubMed |
description | We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu [Formula: see text] N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti [Formula: see text] CuN phase. |
format | Online Article Text |
id | pubmed-8227993 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-82279932021-06-26 Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering Mukhopadhyay, Arun Kumar Roy, Avishek Bhattacharjee, Gourab Das, Sadhan Chandra Majumdar, Abhijit Wulff, Harm Hippler, Rainer Materials (Basel) Article We report the surface stoichiometry of Ti [Formula: see text]-Cu [Formula: see text] N [Formula: see text] thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu [Formula: see text] N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti [Formula: see text] CuN phase. MDPI 2021-06-09 /pmc/articles/PMC8227993/ /pubmed/34207839 http://dx.doi.org/10.3390/ma14123191 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Mukhopadhyay, Arun Kumar Roy, Avishek Bhattacharjee, Gourab Das, Sadhan Chandra Majumdar, Abhijit Wulff, Harm Hippler, Rainer Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title | Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title_full | Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title_fullStr | Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title_full_unstemmed | Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title_short | Surface Stoichiometry and Depth Profile of Ti(x)-Cu(y)N(z) Thin Films Deposited by Magnetron Sputtering |
title_sort | surface stoichiometry and depth profile of ti(x)-cu(y)n(z) thin films deposited by magnetron sputtering |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8227993/ https://www.ncbi.nlm.nih.gov/pubmed/34207839 http://dx.doi.org/10.3390/ma14123191 |
work_keys_str_mv | AT mukhopadhyayarunkumar surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT royavishek surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT bhattacharjeegourab surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT dassadhanchandra surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT majumdarabhijit surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT wulffharm surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering AT hipplerrainer surfacestoichiometryanddepthprofileoftixcuynzthinfilmsdepositedbymagnetronsputtering |