Dry Film Resist Laminated Microfluidic System for Electrical Impedance Measurements

In micro-electrical-mechanical systems (MEMS), thick structures with high aspect ratios are often required. Dry film photoresist (DFR) in various thicknesses can be easily laminated and patterned using standard UV lithography. Here, we present a three-level DFR lamination process of SUEX for a micro...

Descripción completa

Detalles Bibliográficos
Autores principales: Cao, Yuan, Floehr, Julia, Ingebrandt, Sven, Schnakenberg, Uwe
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8228546/
https://www.ncbi.nlm.nih.gov/pubmed/34072385
http://dx.doi.org/10.3390/mi12060632

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8228546/
https://www.ncbi.nlm.nih.gov/pubmed/34072385
http://dx.doi.org/10.3390/mi12060632

Ejemplares similares