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Dry Film Resist Laminated Microfluidic System for Electrical Impedance Measurements
In micro-electrical-mechanical systems (MEMS), thick structures with high aspect ratios are often required. Dry film photoresist (DFR) in various thicknesses can be easily laminated and patterned using standard UV lithography. Here, we present a three-level DFR lamination process of SUEX for a micro...
Autores principales: | Cao, Yuan, Floehr, Julia, Ingebrandt, Sven, Schnakenberg, Uwe |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8228546/ https://www.ncbi.nlm.nih.gov/pubmed/34072385 http://dx.doi.org/10.3390/mi12060632 |
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