The Effect of Nitrogen Incorporation on the Optical Properties of Si-Rich a-SiCx Films Deposited by VHF PECVD

The influence of N incorporation on the optical properties of Si-rich a-SiC(x) films deposited by very high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD) was investigated. The increase in N content in the films was found to cause a remarkable enhancement in photoluminescence (PL)....

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Detalles Bibliográficos
Autores principales: Li, Hongliang, Lin, Zewen, Guo, Yanqing, Song, Jie, Huang, Rui, Lin, Zhenxu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8228809/
https://www.ncbi.nlm.nih.gov/pubmed/34070734
http://dx.doi.org/10.3390/mi12060637

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8228809/
https://www.ncbi.nlm.nih.gov/pubmed/34070734
http://dx.doi.org/10.3390/mi12060637

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