Cargando…
Improvement of Resistive Switching Performance in Sulfur-Doped HfOx-Based RRAM
In order to improve the electrical performance of resistive random access memory (RRAM), sulfur (S)-doping technology for HfOx-based RRAM is systematically investigated in this paper. HfOx films with different S-doping contents are achieved by atmospheric pressure chemical vapor deposition (APCVD) u...
Autores principales: | Zhang, Zhenzhong, Wang, Fang, Hu, Kai, She, Yu, Song, Sannian, Song, Zhitang, Zhang, Kailiang |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8233777/ https://www.ncbi.nlm.nih.gov/pubmed/34208616 http://dx.doi.org/10.3390/ma14123330 |
Ejemplares similares
-
Bipolar Resistive Switching Behavior of PVP-GQD/HfOx/ITO/Graphene Hybrid Flexible Resistive Random Access Memory
por: Kim, Jin Mo, et al.
Publicado: (2021) -
Atomic Layer-Deposited HfAlOx-Based RRAM with Low Operating Voltage for Computing In-Memory Applications
por: He, Zhen-Yu, et al.
Publicado: (2019) -
Geometric conductive filament confinement by nanotips for resistive switching of HfO(2)-RRAM devices with high performance
por: Niu, Gang, et al.
Publicado: (2016) -
HFOX: a fibre-optic extender for the high-performance parallel interface, HiPPL
por: Haben, M, et al.
Publicado: (1993) -
Ta-Doped Sb(2)Te Allows Ultrafast Phase-Change Memory with Excellent High-Temperature Operation Characteristics
por: Xue, Yuan, et al.
Publicado: (2021)