Cargando…
High-Resolution Two-Dimensional Imaging of the 4H-SiC MOSFET Channel by Scanning Capacitance Microscopy
In this paper, a two-dimensional (2D) planar scanning capacitance microscopy (SCM) method is used to visualize with a high spatial resolution the channel region of large-area 4H-SiC power MOSFETs and estimate the homogeneity of the channel length over the whole device perimeter. The method enabled v...
Autores principales: | Fiorenza, Patrick, Alessandrino, Mario S., Carbone, Beatrice, Russo, Alfio, Roccaforte, Fabrizio, Giannazzo, Filippo |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8234276/ https://www.ncbi.nlm.nih.gov/pubmed/34205790 http://dx.doi.org/10.3390/nano11061626 |
Ejemplares similares
-
A look underneath the SiO(2)/4H-SiC interface after N(2)O thermal treatments
por: Fiorenza, Patrick, et al.
Publicado: (2013) -
Nanoscale characterization of electrical transport at metal/3C-SiC interfaces
por: Eriksson, Jens, et al.
Publicado: (2011) -
The Influence of Special Environments on SiC MOSFETs
por: Li, Zhigang, et al.
Publicado: (2023) -
Al(2)O(3) Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices
por: Schilirò, Emanuela, et al.
Publicado: (2023) -
Investigation of 1200 V SiC MOSFETs’ Surge Reliability
por: Li, Huan, et al.
Publicado: (2019)