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Extensive Analysis on the Effects of Post-Deposition Annealing for ALD-Deposited Al(2)O(3) on an n-Type Silicon Substrate
In this study, an investigation was performed on the properties of atomic-layer-deposited aluminum oxide (Al(2)O(3)) on an n-type silicon (n-Si) substrate based on the effect of post-deposition heat treatment, which was speckled according to ambient temperature and treatment applied time. Based on t...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8235433/ https://www.ncbi.nlm.nih.gov/pubmed/34208573 http://dx.doi.org/10.3390/ma14123328 |