Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes

This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitors are investigated. By adapti...

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Autores principales: Chao, Yi-Jie, Yang, Kai-Wei, Su, Chi, Lin, Chrong-Jung, King, Ya-Chin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2021
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8254684/
https://www.ncbi.nlm.nih.gov/pubmed/34216286
http://dx.doi.org/10.1186/s11671-021-03570-7
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author Chao, Yi-Jie
Yang, Kai-Wei
Su, Chi
Lin, Chrong-Jung
King, Ya-Chin
author_facet Chao, Yi-Jie
Yang, Kai-Wei
Su, Chi
Lin, Chrong-Jung
King, Ya-Chin
author_sort Chao, Yi-Jie
collection PubMed
description This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitors are investigated. By adapting the novel PID detectors, the maximum charging levels of the detectors have been enhanced.
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spelling pubmed-82546842021-07-20 Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes Chao, Yi-Jie Yang, Kai-Wei Su, Chi Lin, Chrong-Jung King, Ya-Chin Nanoscale Res Lett Nano Express This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitors are investigated. By adapting the novel PID detectors, the maximum charging levels of the detectors have been enhanced. Springer US 2021-07-03 /pmc/articles/PMC8254684/ /pubmed/34216286 http://dx.doi.org/10.1186/s11671-021-03570-7 Text en © The Author(s) 2021 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Nano Express
Chao, Yi-Jie
Yang, Kai-Wei
Su, Chi
Lin, Chrong-Jung
King, Ya-Chin
Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title_full Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title_fullStr Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title_full_unstemmed Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title_short Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes
title_sort wide range detector of plasma induced charging effect for advanced cmos beol processes
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8254684/
https://www.ncbi.nlm.nih.gov/pubmed/34216286
http://dx.doi.org/10.1186/s11671-021-03570-7
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