Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO(2)

[Image: see text] This work demonstrates that ions have a strong impact on the growth per cycle (GPC) and material properties during plasma-assisted atomic layer deposition (ALD) of TiO(2) (titanium dioxide), even under mild plasma conditions with low-energy (<20 eV) ions. Using vertical trench n...

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Detalles Bibliográficos
Autores principales: Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A., Puurunen, Riikka L., Kessels, Wilhelmus M. M., Knoops, Harm C. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8280614/
https://www.ncbi.nlm.nih.gov/pubmed/34276135
http://dx.doi.org/10.1021/acs.chemmater.1c00781

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8280614/
https://www.ncbi.nlm.nih.gov/pubmed/34276135
http://dx.doi.org/10.1021/acs.chemmater.1c00781

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