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Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO(2)

[Image: see text] This work demonstrates that ions have a strong impact on the growth per cycle (GPC) and material properties during plasma-assisted atomic layer deposition (ALD) of TiO(2) (titanium dioxide), even under mild plasma conditions with low-energy (<20 eV) ions. Using vertical trench n...

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Detalles Bibliográficos
Autores principales:	Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A., Puurunen, Riikka L., Kessels, Wilhelmus M. M., Knoops, Harm C. M.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	American Chemical Society 2021
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8280614/ https://www.ncbi.nlm.nih.gov/pubmed/34276135 http://dx.doi.org/10.1021/acs.chemmater.1c00781

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