Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime

This paper focuses on the power dissipation of a plasma torch used for an optical surface fabrication process. The process utilizes an inductively coupled plasma (ICP) torch that is equipped with a De-Laval nozzle for the delivery of a highly collimated plasma jet. The plasma torch makes use of a se...

Descripción completa

Detalles Bibliográficos
Autores principales: Yu, Nan, Jourdain, Renaud, Gourma, Mustapha, Xu, Fangda, Bennett, Adam, Fang, Fengzhou
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8303556/
https://www.ncbi.nlm.nih.gov/pubmed/34357244
http://dx.doi.org/10.3390/mi12070834

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8303556/
https://www.ncbi.nlm.nih.gov/pubmed/34357244
http://dx.doi.org/10.3390/mi12070834

Ejemplares similares