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Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime
This paper focuses on the power dissipation of a plasma torch used for an optical surface fabrication process. The process utilizes an inductively coupled plasma (ICP) torch that is equipped with a De-Laval nozzle for the delivery of a highly collimated plasma jet. The plasma torch makes use of a se...
Autores principales: | Yu, Nan, Jourdain, Renaud, Gourma, Mustapha, Xu, Fangda, Bennett, Adam, Fang, Fengzhou |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8303556/ https://www.ncbi.nlm.nih.gov/pubmed/34357244 http://dx.doi.org/10.3390/mi12070834 |
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