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Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content

In this work, selected properties of metallic and oxide thin films based on titanium and cobalt were described. Thin-film coatings were prepared using the magnetron sputtering method. The deposition was carried out from sintered targets with different Co-content (2 at.%, 12 at.% and 50 at.%). The re...

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Autores principales: Wojcieszak, Damian, Mazur, Michał, Pokora, Patrycja, Wrona, Adriana, Bilewska, Katarzyna, Kijaszek, Wojciech, Kotwica, Tomasz, Posadowski, Witold, Domaradzki, Jarosław
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8304873/
https://www.ncbi.nlm.nih.gov/pubmed/34300716
http://dx.doi.org/10.3390/ma14143797
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author Wojcieszak, Damian
Mazur, Michał
Pokora, Patrycja
Wrona, Adriana
Bilewska, Katarzyna
Kijaszek, Wojciech
Kotwica, Tomasz
Posadowski, Witold
Domaradzki, Jarosław
author_facet Wojcieszak, Damian
Mazur, Michał
Pokora, Patrycja
Wrona, Adriana
Bilewska, Katarzyna
Kijaszek, Wojciech
Kotwica, Tomasz
Posadowski, Witold
Domaradzki, Jarosław
author_sort Wojcieszak, Damian
collection PubMed
description In this work, selected properties of metallic and oxide thin films based on titanium and cobalt were described. Thin-film coatings were prepared using the magnetron sputtering method. The deposition was carried out from sintered targets with different Co-content (2 at.%, 12 at.% and 50 at.%). The relation between the Ti–Co target composition and the Co-content in the metallic and oxide films was examined. There was 15–20% more cobalt in the films than in the target. Moreover, the deposition rate under neutral conditions (in Ar plasma) was even 10-times higher compared to oxidizing Ar:O(2) (70:30) plasma. A comprehensive analysis of the structural properties (performed with GIXRD and SEM) revealed the amorphous nature of (Ti,Co)Ox coatings, regardless of the cobalt content in the coating. The fine-grained, homogenous microstructure was observed, where cracks and voids were identified only for films with high Co-content. Optical studies have shown that these films were well transparent (60% ÷ 80%), and the amount of cobalt in the target from which they were sputtered had a significant impact on the decrease in the transparency level, the slight shift of the absorption edge position (from 279 nm to 289 nm) as well as the decrease in their optical band gap energy (from 3.13 eV to 1.71 eV). Electrical studies have shown that in (Ti,Co)Ox thin films, a unipolar memristive-like effect can be observed. The occurrence of such effects has not been reported so far in the case of TiO(2) coatings with the addition of Co.
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spelling pubmed-83048732021-07-25 Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content Wojcieszak, Damian Mazur, Michał Pokora, Patrycja Wrona, Adriana Bilewska, Katarzyna Kijaszek, Wojciech Kotwica, Tomasz Posadowski, Witold Domaradzki, Jarosław Materials (Basel) Article In this work, selected properties of metallic and oxide thin films based on titanium and cobalt were described. Thin-film coatings were prepared using the magnetron sputtering method. The deposition was carried out from sintered targets with different Co-content (2 at.%, 12 at.% and 50 at.%). The relation between the Ti–Co target composition and the Co-content in the metallic and oxide films was examined. There was 15–20% more cobalt in the films than in the target. Moreover, the deposition rate under neutral conditions (in Ar plasma) was even 10-times higher compared to oxidizing Ar:O(2) (70:30) plasma. A comprehensive analysis of the structural properties (performed with GIXRD and SEM) revealed the amorphous nature of (Ti,Co)Ox coatings, regardless of the cobalt content in the coating. The fine-grained, homogenous microstructure was observed, where cracks and voids were identified only for films with high Co-content. Optical studies have shown that these films were well transparent (60% ÷ 80%), and the amount of cobalt in the target from which they were sputtered had a significant impact on the decrease in the transparency level, the slight shift of the absorption edge position (from 279 nm to 289 nm) as well as the decrease in their optical band gap energy (from 3.13 eV to 1.71 eV). Electrical studies have shown that in (Ti,Co)Ox thin films, a unipolar memristive-like effect can be observed. The occurrence of such effects has not been reported so far in the case of TiO(2) coatings with the addition of Co. MDPI 2021-07-07 /pmc/articles/PMC8304873/ /pubmed/34300716 http://dx.doi.org/10.3390/ma14143797 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Wojcieszak, Damian
Mazur, Michał
Pokora, Patrycja
Wrona, Adriana
Bilewska, Katarzyna
Kijaszek, Wojciech
Kotwica, Tomasz
Posadowski, Witold
Domaradzki, Jarosław
Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title_full Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title_fullStr Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title_full_unstemmed Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title_short Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content
title_sort properties of metallic and oxide thin films based on ti and co prepared by magnetron sputtering from sintered targets with different co-content
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8304873/
https://www.ncbi.nlm.nih.gov/pubmed/34300716
http://dx.doi.org/10.3390/ma14143797
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