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Metal-Assisted Catalytic Etching (MACE) for Nanofabrication of Semiconductor Powders
Electroless etching of semiconductors has been elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitated the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of m...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8304928/ https://www.ncbi.nlm.nih.gov/pubmed/34209231 http://dx.doi.org/10.3390/mi12070776 |