Impact of Ar Flow Rates on Micro-Structural Properties of WS(2) Thin Film by RF Magnetron Sputtering

Tungsten disulfide (WS(2)) thin films were deposited on soda-lime glass (SLG) substrates using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The effect of Ar flow rates on the structural, morphology, and electrical properties of the WS(2) thin films was investig...

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Detalles Bibliográficos
Autores principales: Akhtaruzzaman, Md., Shahiduzzaman, Md., Amin, Nowshad, Muhammad, Ghulam, Islam, Mohammad Aminul, Rafiq, Khan Sobayel Bin, Sopian, Kamaruzzaman
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8306877/
https://www.ncbi.nlm.nih.gov/pubmed/34206518
http://dx.doi.org/10.3390/nano11071635

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8306877/
https://www.ncbi.nlm.nih.gov/pubmed/34206518
http://dx.doi.org/10.3390/nano11071635

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