Properties of CrSi(2) Layers Obtained by Rapid Heat Treatment of Cr Film on Silicon

The changes in the morphology and the electrophysical properties of the Cr/n-Si (111) structure depending on the rapid thermal treatment were considered in this study. The chromium films of about 30 nm thickness were deposited via magnetron sputtering. The rapid thermal treatment was performed by th...

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Detalles Bibliográficos
Autores principales: Kuznetsova, Tatyana, Lapitskaya, Vasilina, Solovjov, Jaroslav, Chizhik, Sergei, Pilipenko, Vladimir, Aizikovich, Sergei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8308153/
https://www.ncbi.nlm.nih.gov/pubmed/34209379
http://dx.doi.org/10.3390/nano11071734

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8308153/
https://www.ncbi.nlm.nih.gov/pubmed/34209379
http://dx.doi.org/10.3390/nano11071734

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