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High thermal durability of Ru-based synthetic antiferromagnet by interfacial engineering with Re insertion
Synthetic antiferromagnets (SAFs), composed of Ru spacer with a Re insertion layer, reveal superior thermal stability up to 450 °C annealing, making the back-end of line process a wider manufacturing window and tolerance to integrate the perpendicular magnetic tunneling junctions (P-MTJs) into CMOS...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group UK
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8313549/ https://www.ncbi.nlm.nih.gov/pubmed/34312435 http://dx.doi.org/10.1038/s41598-021-94640-4 |