Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors

An atomistic description of tin deposition on ruthenium and its effect on blistering damage is of great interest in extreme ultraviolet (EUV) lithography. In EUV machines, tin debris from the EUV-emitting tin plasma may be deposited on the mirrors in the optical path. Tin facilitates the formation o...

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Detalles Bibliográficos
Autores principales: Onwudinanti, Chidozie, Brocks, Geert, Koelman, Vianney, Morgan, Thomas, Tao, Shuxia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8323739/
https://www.ncbi.nlm.nih.gov/pubmed/34114582
http://dx.doi.org/10.1039/d1cp01082d

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8323739/
https://www.ncbi.nlm.nih.gov/pubmed/34114582
http://dx.doi.org/10.1039/d1cp01082d

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